Ion implanters
AssigneeApplied Materials, Inc.
InventorsErik J. H. Collart, Michael John King
Life of this patent
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Abstract
The present invention relates to components in ion implanters having surfaces adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to deposition and the present invention addresses problems associated with delamination of deposited material. An ion implanter component is provided that has a surface defining at least in part an ion beam path through the ion implanter, wherein at least a portion of the surface has been roughened. The portion of the surface may be roughened to provide surface features defined at least in part by sharp changes in orientation of adjacent parts of the surface.
Claims18
An ion implanter component having a surface defining at least in part an ion beam path through the ion implanter, wherein at least a portion of the surface has been roughened.
An ion implanter component having a surface defining at least in part an ion beam path through the ion implanter, wherein the surface is faceted to provide a plurality of faces separated by edges.
An ion implanter component having a surface defining at least in part an ion beam path through the ion implanter, wherein at least a portion of the surface is textured with a pattern comprising surface features with a depth of between 0.5 mm and 5 mm, and a pitch of between 0.5 mm and 5 mm.
A method of making an ion implanter component having a surface intended to define at least in part an ion beam path through the ion implanter, the method comprising roughening at least a portion of the surface.
Dependencies are inferred from the claim text.