Emission detecting analysis system and method of detecting emission on object
AssigneeSamsung Electronics Co., Ltd.
InventorHo-Jin Lee
Life of this patent
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Abstract
According to an emission detecting analysis system and method, a test target is placed on a stage inside a chamber. A scanning electron microscope (SEM) column is installed at the chamber to obtain an image of the test target, and an emission detector column is installed at the chamber to detect light emission of the test target. High-magnification emission analysis and accurate detection of an emission point at a test target are obtained. In addition, a physical structure of the emission point is analyzed at the test target to reduce time required for analyzing a failure.
Claims19
An emission analysis system comprising:
- a chamber;
- a rotatable stage inside the chamber on which a test target is placed;
- a scanning electron microscope (SEM) column for obtaining an image of the test target;
- and
- an emission detector column for detecting a light emission of the test target.
An emission analysis method comprising:
- obtaining a scanning electron microscope (SEM) image of a test target;
- obtaining a failed image, where an emission point detected at the test target is marked, by means of an emission detector;
- and
- overlapping the failed image with the SEM image to mark the emission point on the SEM image.
Dependencies are inferred from the claim text.