Power Supply for an Ion Implantation System

An ion implantation device comprising:

• an ion source to generate an ion beam;
• at least one ion beam accelerator to accelerate the ion beam to a desired energy level;
• a power supply operatively connected to the ion beam accelerator;
• at least one mass analyzer to remove undesired ion species from the ion beam;
• at least one beam shaping element to shape and direct the ion beam;
• a substrate processing end station upon which the shaped ion beam is incident;
• and
• a controller communicatively coupled to the ion source, the power supply, and the end station, wherein the power supply comprises:
• a power inverter;
• a high voltage power generation unit that receives source power from the power inverter;
• and
• an enclosure comprising a dielectric material to encase at least a portion of the high voltage power generation unit.

A power supply system for ion implantation equipment comprising:

• a power inverter;
• a high voltage power generation unit that receives source power from the power inverter, wherein the high voltage power generation unit comprises a transformer for providing an output power that is multiplied to a desired output level and supplied to an ion beam accelerator;
• an enclosure comprised of a dielectric material to encase at least a portion of the high voltage power generation unit;
• and
• a stack driver to receive controls signals from a computerized controller of the implantation equipment, indicative of a desired output power of the transformer and to cause the high voltage power generation unit to output the output power at the desired output level.