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US 2008/0164244 A9Published application
Delivery of solid chemical precursors
AssigneeMicron Technology, Inc.
InventorGurtej Sandhu
Life of this patent
Estimating the term…
Abstract
Systems and methods are provided for delivering solid precursors. In certain embodiments of the present application, a flow monitor, pressure sensor, or temperature sensor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. To avoid condensation of the solid precursor material in the delivery lines, a controller is placed in a feed back loop to make adjustments to the amount of vapor available. Additional embodiments are disclosed and claimed.
Claims15
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a flow monitor arranged to measure the flow of said vapor from said vaporization chamber;
- and
- a controller configured to control the temperature of said heating device as a function of said measured flow of vapor.
4 more elements
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a flow monitor arranged to measure the flow of said vapor from said vaporization chamber;
- a pressure sensor arranged to measure the pressure of vapor flowing from said vaporization chamber;
- a gas source coupled to said vaporization chamber;
- and
- a controller configured to control the temperature of said heating device as a function of said measured flow of vapor from said vaporization chamber and control the supply of inert gas to said vapor flowing from said vaporization chamber as a function of pressure measured by said pressure sensor.
6 more elements
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a flow monitor arranged to measure the flow of said vapor from said vaporization chamber;
- a pressure sensor arranged to measure the pressure of vapor flowing from said vaporization chamber;
- a temperature sensor arranged to measure the temperature of vapor flowing from said vaporization chamber;
- a gas source configured to supply an inert gas to vapor flowing from said vaporization chamber;
- a flow regulator coupled to said gas source;
- and
- a controller configured to control the temperature of said heating device as a function of said measured flow of vapor, and adjust the flow of said inert gas through said flow regulator as a function of said measured pressure and temperature of said vapor.
8 more elements
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a flow monitor arranged to measure the flow of said vapor from said vaporization chamber;
- a pump arranged to siphon excess vapor from said vaporization chamber;
- and
- a controller configured to bleed off excess amounts of said vapor as a function of the measured flow of said vapor from said vaporization chamber by utilizing said pump to siphon excess vapor from said vaporization chamber.
5 more elements
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a pressure sensor arranged to measure the pressure of said vapor flowing from said vaporization chamber;
- a pump arranged to siphon excess vapor from said vaporization chamber;
- and
- a controller configured to bleed off excess amounts of said vapor as a function of the measured pressure of said vapor from said vaporization chamber by utilizing said pump to siphon excess vapor from said vaporization chamber.
5 more elements
A device comprising a vapor delivery system, said vapor delivery system comprising:
- a vaporization chamber;
- a first surface within said vaporization chamber;
- a solid precursor material supported by said first surface within said chamber;
- a heating device configured to heat said first surface to a temperature sufficient to transform said solid precursor material to a vapor;
- a temperature sensor arranged to measure the temperature of said vapor flowing from said vaporization chamber;
- a pump arranged to siphon excess vapor from said vaporization chamber;
- and
- a controller configured to bleed off excess amounts of said vapor as a function of the measured temperature of said vapor from said vaporization chamber by utilizing said pump to siphon excess vapor from said vaporization chamber.
5 more elements
Dependencies are inferred from the claim text.