Substrate for organic el display and method of producing the substrate
AssigneeCanon Kabushiki Kaisha
InventorsJunji Ohyama, Tomonari Horikiri, Katsumi Nakagawa, Hiroyuki Fuchigami
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Abstract
A substrate for an organic EL display including an insulating layer, in which release of a substance derived from a material for the insulating layer by heating at a temperature equal to or lower than a temperature obtained by subtracting 20° C. from a decomposition temperature of the material for the insulating layer is detected by mass spectrometric detection at an S/N ratio smaller than 3/1.
Claims10
A substrate for an organic EL display comprising an insulating layer, wherein release of a substance derived from a material for the insulating layer by heating at a temperature equal to or lower than a temperature obtained by subtracting 20° C. from a decomposition temperature of the material for the insulating layer is detected by mass spectrometric detection at an S/N ratio smaller than 3/1.
A substrate for an organic EL display comprising:
- a planarizing film formed of an organic compound;
- and
- a device isolation film formed of an organic compound,
- wherein:
- a decomposition temperature of a material for the planarizing film is higher than a decomposition temperature of a material for the device isolation film;
- and
- release of a substance derived from the material for the planarizing film by heating at a temperature equal to or lower than a temperature obtained by subtracting 20° C. from the decomposition temperature of the material for the planarizing film is detected by a mass spectrometric detection method at an S/N ratio smaller than 3/1.
A method of producing a substrate for an organic EL display having an insulating layer, the method comprising the step of forming the insulating layer, wherein the step of forming the insulating layer comprises:
- a step of applying a solution of a material for the insulating layer having a photosensitive acid-generating portion or a precursor material for the material dissolved or dispersed in a solvent to thereby form a film;
- a first heating step of heating the film and removing the solvent in the film;
- a step of patterning the film by irradiating the first-heated film with light through a mask;
- a second heating step of heating the patterned film under an atmosphere for maintaining a temperature equal to or higher than a heat decomposition temperature of the photosensitive acid-generating portion and lower than a curing temperature or a polymerization temperature of the material for the insulating layer;
- and
- a third heating step of heating the second-heated film under an atmosphere for increasing a temperature of the film up to a temperature equal to or lower than a temperature obtained by subtracting 20° C. from a decomposition temperature of the material for the insulating layer at a rate of temperature increase of 10° C./min or less and maintaining the temperature for 30 minutes or longer.
Dependencies are inferred from the claim text.