Method of manufacturing optical interference color display

A method of fabricating an optical interference color display, comprising:

• providing a substrate, and forming a first electrode structure over the substrate;
• defining a first area, a second area, and a third area on the first electrode structure;
• forming a first sacrificial layer over the first electrode structure of the first area;
• forming a second sacrificial layer over the first electrode structure of the second area;
• forming a third sacrificial layer over the first electrode structure of the third area, wherein the first sacrificial layer, the second sacrificial layer and the third sacrificial layer having different etching rates and thicknesses;
• forming a patterned support layer over the first electrode structure;
• forming a second electrode layer over the first sacrificial layer inside the first area, the second sacrificial layer inside the second area, the third sacrificial layer inside the third area and a portion of the patterned support layer;
• and
• removing the first sacrificial layer, the second sacrificial layer and the third sacrificial layer to form a plurality of air gaps between the first electrode structure and the second electrode layer.