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US 2008/0157284 A1Published application
Guard ring extension to prevent reliability failures
AssigneeIntel Corporation
InventorsNicole Meier Chang, George J. Korsh, Shafqat Ahmed, John Nugent, Ed Nabighian
Life of this patent
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Abstract
An embodiment of the present invention is a technique to prevent reliability failures in semiconductor devices. A trench is patterned in a polyimide layer over a guard ring having a top metal layer. A passivation layer is etched at bottom of the trench. A capping layer is deposited on the trench over the etched passivation layer. The capping layer and the top metal layer form a mechanical strong interface to prevent a crack propagation.
Claims25
A method comprising:
- patterning a trench in a polyimide layer over a guard ring having a top metal layer;
- etching a passivation layer at bottom of the trench;
- and
- depositing a capping layer on the trench over the etched passivation layer, the capping layer and the top metal layer forming a mechanical strong interface to prevent a crack propagation.
1 more element
A method comprising:
- patterning a first passivation layer over an area including a guard ring;
- depositing a metal layer on the patterned passivation layer on top of the guard ring;
- etching the metal layer to form a cap on top of the guard ring,
- depositing a second passivation layer on the cap;
- and
- depositing a polyimide layer on the second passivation layer.
3 more elements
A method comprising:
- patterning a polyimide layer and a passivation layer over a top metal layer piece, the polyimide layer and the passivation layer covering a guard ring including a top metal layer;
- and
- depositing a capping layer on the patterned polyimide and passivation layers, the capping layer and the top metal layer piece forming a mechanical strong interface to hinder a crack initiation near the top metal layer piece.
A method comprising:
- patterning a passivation layer on top of a guard ring;
- and
- depositing a first polyimide layer on the passivation layer to cover the passivation layer such that an edge of the passivation layer is not exposed.
A device comprising:
- a trench patterned in a polyimide layer over a guard ring having a top metal layer;
- a passivation layer etched at bottom of the trench;
- and
- a capping layer deposited on the trench over the etched passivation layer, the capping layer and the top metal layer forming a mechanical strong interface to prevent a crack propagation.
1 more element
A device comprising:
- a first passivation layer patterned over an area including a guard ring;
- a metal layer deposited and etched on the patterned passivation layer on top of the guard ring, the metal layer forming a cap on top of the guard ring,
- a second passivation layer deposited on the cap;
- and
- a polyimide layer deposited on the second passivation layer.
2 more elements
A device comprising:
- a polyimide layer and a passivation layer under the polyimide layer patterned over a top metal layer piece, the polyimide and the passivation layers covering a guard ring including a top metal layer;
- and
- a capping layer deposited on the patterned polyimide and passivation layers, the capping layer and the top metal layer piece forming a mechanical strong interface to hinder a crack initiation near the top metal layer piece.
A device comprising:
- a passivation layer patterned on top of a guard ring;
- and
- a first polyimide layer deposited on the passivation layer to cover the passivation layer such that an edge of the passivation layer is not exposed.
A system comprising:
- a front end processing unit to receive and transmit a radio frequency (RF) signal, the RF signal being converted to digital data;
- and
- a processor coupled to the front end processing unit to process the digital data, the processor comprising a die, and a guard ring assembly comprising:
- a guard ring adjacent to the die, the guard ring having a top metal layer,
- a trench patterned in a polyimide layer over the guard ring,
- a passivation layer etched at bottom of the trench, and
- a capping layer deposited on the trench over the etched passivation layer,
- the capping layer and the top metal layer forming a mechanical strong interface to prevent a crack propagation.
5 more elements
Dependencies are inferred from the claim text.