Back to results
US 2008/0157275 A1Published application
Display device and method of manufacturing the same
AssigneeMitsubishi Electric Corporation
InventorTakuji Imamura
Life of this patent
Estimating the term…
Abstract
A display device includes a substrate, a capacitor lower electrode having a polycrystalline silicon film formed over the substrate and a contact metal film provided over the polycrystalline silicon film, a gate insulating film formed over the capacitor lower electrode and a gate metal electrode formed to a position opposing the capacitor lower electrode over the gate insulating film and formed to be disposed inner side of the capacitor lower electrode in top view.
Claims6
A display device comprising:
- a substrate;
- a capacitor lower electrode having a polycrystalline silicon film formed over the substrate and a contact metal film provided over the polycrystalline silicon film;
- a gate insulating film formed over the capacitor lower electrode;
- and
- a gate metal electrode formed to a position opposing the capacitor lower electrode over the gate insulating film and formed to be disposed inner side of the capacitor lower electrode in top view.
2 more elements
A method of manufacturing a display device comprising:
- forming a capacitor lower electrode including a polycrystalline silicon layer over a substrate and a contact metal film disposed over the polycrystalline silicon film;
- forming a gate insulating film over the capacitor lower electrode;
- and
- forming a gate metal electrode disposed inner side of the capacitor lower electrode over the gate insulating film in top view.
1 more element
Dependencies are inferred from the claim text.