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US 2008/0157245 A1Published application
Manufacturing method of microlens of cmos image sensor
AssigneeDongbu HiTek Co., Ltd.
InventorEun-Soo Jeong
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Abstract
A method of manufacturing an image sensor having a minimized spatial distance between microlenses to improve integration, and thus, enhance the ability of each microlens to condense light incident.
Claims20
A method comprising:
- forming a color filter array over a semiconductor substrate;
- forming a planarization layer over the color filter array;
- depositing a first oxide film over the planarization layer;
- forming a plurality of barrier ribs by exposing and developing the first oxide film;
- and then forming a microlens between the barrier ribs.
2 more elements
A method comprising:
- forming a thermal resin over a semiconductor substrate;
- forming a color filter array over a semiconductor substrate including the thermal resin;
- forming a planarization layer over the color filter array;
- forming a plurality of barrier ribs spaced by a gap over the planarization layer;
- forming a microlens in a respective gap over the planarization layer;
- and then reducing a spatial gap between respective microlenses.
3 more elements
An apparatus comprising:
- a color filter array formed over a semiconductor substrate;
- a planarization layer formed over the color filter array;
- a plurality of barrier ribs spaced by a gap formed over the planarization layer;
- a microlens formed in a respective gap over the planarization layer;
- and
- an oxide film formed over each microlens and the barrier ribs.
3 more elements
Dependencies are inferred from the claim text.