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US 2008/0157243 A1Published application
Image Sensor and Method for Manufacturing the Same
OwnerEun Sang Choinventor
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Abstract
Embodiments of an image sensor and method of manufacturing the same are provided. An image sensor can include an interlayer dielectric layer formed on a substrate including a photodiode; a color filter layer formed on the interlayer dielectric layer; a first oxide film microlens formed on the color filter layer; and a second oxide film microlens formed on the first oxide film microlens.
Claims20
An image sensor comprising:
- a plurality of first oxide film microlenses formed on a substrate;
- and
- a second oxide film microlens formed on each first oxide film microlens, wherein the second oxide microlens is formed in a spacer form at sides of each first oxide film microlens.
A method for manufacturing an image sensor, comprising:
- forming a plurality of first microlenses on a substrate;
- and
- depositing a transparent film on the plurality of first microlenses;
- and
- etching the transparent film to provide a zero-gap between each of the plurality of first microlenses.
2 more elements
Dependencies are inferred from the claim text.