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US 2008/0157137 A1Published application
Image Sensor and Fabricating Method Thereof
OwnerEun Sang Choinventor
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Abstract
An image sensor and a method of fabricating an image sensor are provided. The image sensor can include a color filter layer formed on a substrate and a microlens array on the color filter layer. The microlens array includes a first set of microlenses formed of a low temperature oxide layer and a second set of microlenses formed of a photoresist layer. The second set of microlenses can be formed between the first set of microlenses to provide a zero gap.
Claims19
An image sensor comprising:
- a microlens array formed on a substrate, the microlens array comprising:
- a first set of microlenses comprising a low temperature oxide;
- a second set of microlenses comprising a photoresist;
- and
- a color filter layer formed between the microlens array and the substrate.
2 more elements
A method of fabricating an image sensor, the method comprising:
- forming a low temperature oxide layer on a substrate;
- forming a first photoresist layer on the low temperature oxide layer;
- patterning the first photoresist layer to form sacrificial microlenses;
- etching the sacrificial microlenses and low temperature oxide layer to form a first set of microlenses formed of the low temperature oxide layer;
- patterning a second photoresist layer on the substrate;
- and
- forming a microlens array comprising the first set of microlenses and a second set of microlenses formed of the second photoresist layer through heat treatment.
4 more elements
Dependencies are inferred from the claim text.