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US 2008/0156998 A1Published application
Focused Ion Beam Apparatus
OwnerYasuhiko Sugiyamainventor
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Abstract
A focused ion beam apparatus including a plasma type gas ion source for generating an ion beam, and an ion optical system for gathering the ion beam generated from the plasma type gas ion source onto a sample. The ion optical system is constructed by a constitution having 2 pieces of basic electrostatic lenses and an ion optical system magnification of the 2 pieces of basic electrostatic lenses is set to be equal to or smaller than 1/300.
Claims4
A focused ion beam apparatus characterized in a focused ion beam apparatus comprising:
- a plasma type gas ion source for generating an ion;
- and
- an ion optical system for gathering the ion generated from the plasma type gas ion source onto a sample;
- wherein the ion optical system is constructed by 2 pieces of basic electrostatic lenses;
- and
- wherein a magnification of the ion optical system combined with the 2 pieces of basic electrostatic lenses is set to be equal to or smaller than 1/300.
3 more elements
Dependencies are inferred from the claim text.