Method for fabricating image sensor
AssigneeDongbu HiTek Co., Ltd.
InventorsKi Jun Yun, Sang Il Hwang
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Abstract
Provided is a method for fabricating an image sensor. In the method, a low temperature oxide layer is formed on a color filter layer, and a photoresist pattern is formed on the low temperature oxide layer. Subsequently, a heat treatment is performed on the photoresist pattern to form sacrificial microlenses. The sacrificial microlenses and the low temperature oxide layer are etched to form preliminary microlenses formed the low temperature oxide layer. The preliminary microlenses are etched to form microlenses having a reduced curvature radius in comparison with that of the preliminary microlenses.
Claims20
A method for fabricating an image sensor, the method comprising:
- forming a low temperature oxide layer on a color filter layer;
- forming a photoresist pattern on the low temperature oxide layer;
- heating the photoresist pattern to form sacrificial microlenses;
- etching the sacrificial microlenses and the low temperature oxide layer to form preliminary microlenses formed in the low temperature oxide layer;
- and
- etching the preliminary microlenses to form microlenses having a reduced curvature radius in comparison with that of the preliminary microlenses.
Dependencies are inferred from the claim text.