Substrate processing apparatus
OwnerIchiro Mitsuyoshiinventor
Life of this patent
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Abstract
A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and the rotary actuator. The rotary actuator rotates the first movable plate, the second movable plate and the fixed plate around a horizontal axis. In the reversing unit, a substrate before a back surface cleaning processing is reversed while being held by support pins of the first movable plate and support pins of the fixed plate, and the substrate after the back surface cleaning processing is reversed while being held by support pins of the second movable plate and the support pins of the fixed plate.
Claims7
A substrate processing apparatus that performs processing on a substrate having a top surface and a back surface, comprising:
- a first cleaning processing unit that cleans said back surface of the substrate;
- a reversing device that reverses said top surface and said back surface of the substrate;
- and
- a first transport device that transports the substrate between said first cleaning processing unit and said reversing device, wherein
- said reversing device includes
- a first holding mechanism that holds the substrate,
- a second holding mechanism that holds the substrate, and
- a rotating mechanism that rotates said first and second holding mechanisms around substantially horizontal axes, respectively, and
- said first transport device carries the substrate before cleaning by said first cleaning processing unit into said first holding mechanism of said reversing device, and carries the substrate after the cleaning by said first cleaning processing unit into said second holding mechanism of said reversing device.
Dependencies are inferred from the claim text.