Substrate processing apparatus and substrate processing method
OwnerIchiro Mitsuyoshi, Jun Shibukawa +2inventors
InventorsIchiro Mitsuyoshi, Jun Shibukawa, Shinji Kiyokawa, Tomohiro Kurebayashi
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OwnerIchiro Mitsuyoshi, Jun Shibukawa +2inventors
InventorsIchiro Mitsuyoshi, Jun Shibukawa, Shinji Kiyokawa, Tomohiro Kurebayashi
Estimating the term…
A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.
A substrate processing apparatus that performs processing on a substrate having a top surface and a back surface, comprising:
A substrate processing method that subjects a substrate to processing by a substrate processing apparatus including a carrying in and out region that includes a container platform and a first transport device, a processing region that includes a plurality of processing units and a second transport device and first and second reversing devices provided between said processing region and said carrying in and out region, comprising the steps of:
Dependencies are inferred from the claim text.