Cleaning Liquid And Cleaning Method For Electronic Material
AssigneeSiltronic AG
InventorsTeruo Haibara, Yoshihiro Mori, Takashi Mouri
Life of this patent
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Abstract
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.
Claims20
A cleaning liquid for an electronic material, comprising an aqueous liquid which contains micro-bubbles generated by a hydrogen gas and to which ultrasonic oscillation is imparted.
A method for cleaning an electronic material, comprising contacting the electronic materials with an aqueous liquid in which hydrogen micro-bubbles are present and under ultrasonic irradiation.
Dependencies are inferred from the claim text.