Clustered surface preparation for silicide and metal contacts

A cluster tool arrangement for the integrated pre-cleaning of a semiconductor surface and surface preparation for forming metal and silicide contacts thereon;

• comprising:
• at least one load lock for receiving a semiconductor having an oxide on one surface thereof;
• a transfer chamber for receiving said semiconductor from said at least one load lock under a vacuum condition;
• a pre-treatment chamber for receiving said semiconductor from said transfer chamber, while maintaining said vacuum condition, said substrate being subjected to a dry chemical oxide removal (COR) treatment in said pre-treatment chamber to remove the oxide from said semiconductor surface, and thereafter, re-convey said semiconductor to said transfer chamber;
• and
• a metal deposition chamber for receiving said pre-cleaned substrate from said transfer chamber for depositing metal on said semiconductor surface and form a silicide on said surface to produce contacts.