Back to results
US 2008/0107580 A1Published application
Removal Of Metal Contaminants From Ultra-High Purity Gases
OwnerDaniel Alvarez, Troy B. Scoggins +2inventors
InventorsDaniel Alvarez, Troy B. Scoggins, Tran Doan Nguyen, Yasushi Ohyashiki
Life of this patent
Estimating the term…
Abstract
The invention is a method and apparatus for removing metal compounds from ultra-high purity gases using a purifier material comprising a high surface area inorganic oxide, so that the metals do not deposit on a sensitive device and cause device failure.
Claims20
A method for removing metal contaminants from a ultra-high purity gas stream by contacting the ultra-high purity gas stream with a purification material comprising a high surface area inorganic oxide containing surface oxygen atoms with a coordination number less than the bulk oxygen atoms.
Dependencies are inferred from the claim text.