Back to results
US 2008/0074658 A1Published application
Method and apparatus for performing limited area spectral analysis
AssigneeApplied Materials, Inc.
InventorsMatthew Davis, Lei Lian, Yasuhiro Uo, Michael Willwerth, Andrei Netchitaliouk
Life of this patent
Estimating the term…
Abstract
A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.
Claims20
A method of monitoring a substrate in a semiconductor substrate processing chamber, comprising:
- acquiring data at a first location on a substrate disposed in a semiconductor substrate processing chamber using an in-situ measuring tool, the measuring tool moveable along two axes;
- moving the measuring tool to at least a second location over the substrate;
- and
- acquiring data at least a second location on the substrate.
1 more element
A method of monitoring a substrate in a semiconductor substrate processing chamber, comprising:
- providing an etch chamber having an in-situ measuring tool, the measuring tool moveable along two axes;
- acquiring data at a first location on a substrate disposed in the etch chamber using the measuring tool;
- moving the measuring tool to at least a second location over the substrate;
- and
- acquiring data at least a second location on the substrate.
2 more elements
Dependencies are inferred from the claim text.