Defining a pattern on a substrate

An apparatus for defining a pattern on a substrate, said apparatus comprising

• an emission source for directing an emission to the substrate, a working position being defined between the emission source and the substrate,
• at least one shadow mask having one or more apertures, and
• at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool,
• wherein the shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position, and
• wherein the inspection device is a Scanning Probe Microscopy (SPM)-device, including one of an STM-, AFM-, DFM- and SNOM-device.

A method for defining a pattern on a substrate comprising the steps of

• providing a substrate and an emission source being directed to the substrate, defining a working position therebetween,
• moving a shadow mask with at least one aperture into the working position, and
• emitting emissions from the emission source through the aperture and towards the substrate in order to define the pattern on the substrate,
• removing the shadow mask from the working position,
• moving at least one inspection tool of an inspection device for inspecting the properties of the substrate and/or the pattern into the working position and
• inspecting the substrate and the pattern with the inspection device.

An apparatus for defining a pattern on a substrate, said apparatus comprising

• an emission source for directing an emission to the substrate, a working position being defined between the emission source and the substrate,
• at least one shadow mask having one or more apertures, and
• at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool,
• wherein the shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position;
• wherein the shadow mask and the inspection tool are provided on separate carriers, said carriers being exchangeably mounted on the movable portion,
• wherein mounting mechanisms are provided for mounting each carrier on the movable portion, at least one of the mounting mechanisms comprising a limit stop element for holding the carrier in a predefined position, and
• wherein the inspection device is a Scanning Probe Microscopy (SPM)-device, including one of an STM-, AFM-, DFM- and SNOM-device.