Laser crystallization apparatus and crystallization method
AssigneeAdvanced LCD Technologies Development Center Co., Ltd.
InventorsYoshio Takami, Tatsuhiro Taguchi
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AssigneeAdvanced LCD Technologies Development Center Co., Ltd.
InventorsYoshio Takami, Tatsuhiro Taguchi
Estimating the term…
A laser crystallization apparatus and a crystallization method with a high throughput are provided. Laser light having a predetermined light intensity distribution is irradiated to a semiconductor film to melt and crystallize, wherein a irradiation position is placed very quickly and with a high positional accuracy, thereby forming the semiconductor film having a large crystal grain size. A laser crystallization apparatus according to one aspect of the present invention comprises a crystallizing laser light source, a phase shifter modulating pulse laser light to have the predetermined light intensity distribution, an excimer imaging optical system, a substrate holding stage mounting a processing substrate and continuously moving in the predetermined direction, a position measuring means, and a signal generating means indicating generation of the pulse laser light based on the position measurement of the stage by the position measuring means.
A laser crystallization apparatus comprising:
A laser crystallization apparatus comprising:
A laser crystallization method comprising:
Dependencies are inferred from the claim text.