Method and apparatus for personalization of semiconductor
AssigneeMicronic Mydata AB
InventorTorbjorn Sandstrom
Life of this patent
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Abstract
A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.
Claims15
-27. (canceled)
A method for fast correction of position errors in a pattern generator using an spatial light modulator (SLM), the method comprising:
- measuring a stage position error compared to a correct position, convolving a bitmap loaded into the SLM by a convolution kernel, said kernel being selected or modified depending on the measured position error to correct said position error.
An apparatus for writing information on a device, the method comprising:
- a first exposure system exposing at least one layer of said device;
- and
- a second exposure system exposing the same at least one layer of said device using a spatial light modulator (SLM).
Dependencies are inferred from the claim text.