Apparatus for measuring semiconductor physical characteristics
AssigneeOptical Reference Systems Limited
InventorsCarl Griffiths, Stuart Irvine, Andrew Stafford
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AssigneeOptical Reference Systems Limited
InventorsCarl Griffiths, Stuart Irvine, Andrew Stafford
Estimating the term…
A reflectometry method and apparatus for gathering meaningful reflectance data indicative of one or more characteristics of a substance being grown on a horizontal substrate within a reaction chamber. The apparatus includes an external light source which shines light into the chamber through an opening having a shutter for selectively permitting or preventing the light from passing in and out of the chamber through the opening. A detector receives light that reflects off the substance and exits the chamber through the opening. During operation, the substrate is rotated about an axis substantially normal to the growing plane within the reaction chamber to ensure uniform deposition of the substance thereon. The shutter momentarily opens in synchronicity with the speed of revolution of the substrate such that substantially the same discrete area of the growing substance is illuminated so as to eliminate the effects of precession on the measurements.
Reflectometry apparatus for gathering meaningful reflectance data indicative of one or more characteristics of a substance being grown within a reaction chamber in real time during growth, said apparatus including a light source disposed to the outside of said reaction chamber which includes a substantially horizontal substrate on which the substance growth occurs, and a detector being capable of converting light into electrical signals which are subsequently subjected to computer processing, the light source and detector being arranged in suitable locations with regard to the substrate such that light impinging on the substrate from the source is substantially reflected directly towards the detector,
A reflectometery method for gathering meaningful reflectance data indicative of one or more characteristics of a substance being grown within a reaction chamber at the time of measurement, said substance being grown on a substrate which is periodically rotated about an axis substantially normal to the growing plane within said reaction chamber to ensure uniform deposition of said substance thereon,
Dependencies are inferred from the claim text.