Process and apparatus for producing porous quartz glass base
AssigneeAsahi Glass Company, Limited
InventorsKei IWATA, Takao Uto, Takuya Sakuma
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Abstract
The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.
Claims7
A process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base,
- wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated.
An apparatus for producing a porous quartz glass base with which a silicon compound is hydrolyzed in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base,
- which apparatus has a heating member for heating a gas discharge pipe for discharging an unnecessary gas from the reaction furnace.
Dependencies are inferred from the claim text.