Method of forming resistance film and image display device thereby
AssigneeCanon Kabushiki Kaisha
InventorYoshio Suzuki
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Abstract
The invention provides a method of forming a resistance film with even thickness and at high speed even in a substrate having micro depressions and projections in its surface. A fine particle dispersion solution is prepared by adding a solution which decreases the absolute value of a ξ potential at the fine particles and a solution which decreases dispersion stability of the fine particles into a solution in which metal oxide fine particles are stably dispersed, a substrate having an insulating surface is immersed in the fine particle dispersion solution to deposit a fine particle aggregation film, and then a resistance film is obtained by performing heat treatment.
Claims23
A method of forming a resistance film on a surface of a substrate having an insulating surface, the resistance film having a sheet resistivity less than that of the insulating surface, the method comprising the steps of:
- immersing the substrate in a solution in which fine particles made of a material of the resistance film are dispersed to wet a fine particle dispersion solution to the surface of the substrate;
- decreasing an absolute value of a ξ potential at the fine particles in the fine particle dispersion solution wetted to the surface of the substrate so as to make it smaller than an absolute value of ξ potential at the fine particles when these particles are being dispersed in the solution, to deposit a fine particle aggregation film on the surface of the substrate;
- and
- burning the fine particle aggregation film to form the resistance film.
(canceled)
Dependencies are inferred from the claim text.