# US 2007/0216902 A1 · Reference Wafer and Process for Manufacturing Same

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- Number: US 2007/0216902 A1
- Document ID: US20070216902A1
- Status: Published application
- Kind: A1
- Application number: 11/742,468
- Filed: 2007-04-30
- Published: 2007-09-20
- Earliest claimed: 2000-12-08
- Assignees: Litel Instruments
- Inventors: Adlai Smith; Robert Hunter
- Web page: https://patentgrep.com/patent/US20070216902A1

## CPC

- G03F 7/70458: {Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus}
- G03F 1/44: Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
- G03F 7/70516: {Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors}
- G03F 7/70616: {Monitoring the printed patterns}
- G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching}
- G03F 9/7076: {Mark details, e.g. phase grating mark, temporary mark}
- Y10S 430/143: Electron beam
- Y10S 430/168: X-ray exposure process
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.

## Claims

### Claim 1

A reticle for use in constructing a calibration file for an archive media; the reticle comprising a pattern of complementary alignment attributes that are exposed onto an archive media such that the pattern of complementary alignment attributes overlay and interlock with a etched alignment attributes on the archive thereby forming completed alignment attributes, wherein measurements of offsets in the completed alignment attributes are used to construct a calibration file for the archive media based upon the offset measurements and dynamic intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and calibration error of the complementary alignment attributes.

### Claim 2

A calibration reticle for use in constructing a calibration file for an archive media; the calibration reticle comprising a pattern exposed onto an archive media, wherein the pattern of the calibration reticle includes complementary alignment attributes, and the reticle is positioned such that the pattern of complementary alignment attributes overlay and interlock etched alignment attributes on the archive media, thereby forming interlocking rows and columns of completed alignment attributes between adjacent static calibration reticle exposure fields, wherein measurements of offsets in the completed alignment attributes are used to construct a calibration file for the archive media based upon the offset measurements and intrafield lens distortion data of a lens used to expose the pattern of complementary alignment attributes, and manufacturing error data for the calibration reticle.