Water Supply Apparatus And Cleaning System For Cleaning The Water Supply Apparatus

An assembly of a water supply apparatus and a cleaning system for cleaning the water supply apparatus, the water supply apparatus being provided with:

• a tap water inlet;
• a mineral dosing unit with the aid of which, on the basis of tap water, mineral water can be generated;
• water processing means and a control unit designed for controlling at least a part of the water processing means according to a predetermined water processing program, the cleaning system being provided with at least a cleaning agent vessel from which, in use, cleaning agent can be supplied, directly or indirectly, to the water supply apparatus, characterized in that the cleaning system is provided with a cleaning system control unit designed for controlling at least a part of the water processing means according to a predetermined water processing program, for the purpose of cleaning at least a part of the water processing means.

A cleaning system designed for cleaning a water supply apparatus which is provided with a tap water inlet, a mineral dosing unit with the aid of which, on the basis of tap water, mineral water can be generated, and water processing means, the cleaning system being provided with a water inlet and a cleaning agent vessel from which, in use, cleaning agents can be supplied to the water supply apparatus, characterized in that the water inlet can be connected, or has been connected, with the water supply apparatus such that in use, water can flow out of the water supply apparatus into the water inlet of the cleaning system.

An assembly of a water supply apparatus and a cleaning system for cleaning the water supply apparatus, the water supply apparatus being provided with:

• a tap water inlet;
• a mineral dosing unit with the aid of which, on the basis of tap water, mineral water can be generated;
• and water processing means, the cleaning system being provided with at least one cleaning agent vessel from which, in use, cleaning agent can be supplied, directly or indirectly, to the water supply apparatus, characterized in that the assembly is provided with at least one control unit designed for controlling at least a part of the water processing means according to a predetermined cleaning program for the purpose of cleaning at least a part of the water processing means.