Method of measuring warpage of rear surface of substrate
AssigneeSumitomo Electric Industries, Ltd.
InventorsKeiji Ishibashi, Noriko Tanaka
Life of this patent
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Abstract
A method of measuring warpage of a rear surface of a substrate includes a substrate detection step, a best fit plane calculation step, and a warpage calculation step. Further, the method of measuring warpage of a rear surface of a substrate can further includes after the substrate detection step and before the best fit plane calculation step: a noise removal step and an outer peripheral portion removal step; the outer peripheral portion removal step and a smoothing step; or the noise removal step, the outer peripheral portion removal step, and the smoothing step. Thereby, a method of measuring warpage of a rear surface with a high surface roughness of a substrate can be provided.
Claims19
A method of measuring warpage of a rear surface opposite to a crystal growth surface of a substrate using a laser displacement meter,
- said substrate being disposed on a substrate support table,
- comprising:
- a substrate detection step detecting a plurality of displacement values respectively corresponding to a plurality of measurement points on said rear surface of said substrate using said laser displacement meter;
- a noise removal step removing noise contained in said plurality of displacement values;
- an outer peripheral portion removal step calculating a plurality of displacement values for calculation by removing from said plurality of displacement values those respectively corresponding to the measurement points in an outer peripheral portion of said substrate;
- a smoothing step smoothing said plurality of displacement values for calculation to calculate a warped surface;
- a best fit plane calculation step calculating a best fit plane having the minimum distance to said warped surface;
- and
- a warpage calculation step calculating as warpage a sum of a distance from said best fit plane to a point represented by the greatest displacement value of said warped surface on one side with respect to said best fit plane and a distance from said best fit plane to a point represented by the greatest displacement value of said warped surface on the other side with respect to said best fit plane.
A method of measuring warpage of a rear surface opposite to a crystal growth surface of a substrate using a laser displacement meter,
- said substrate being disposed on a substrate support table,
- comprising:
- a substrate detection step detecting a plurality of displacement values respectively corresponding to a plurality of measurement points on said rear surface of said substrate using said laser displacement meter;
- a best fit plane calculation step calculating a best fit plane having the minimum distance to a plurality of points respectively represented by said plurality of displacement values;
- and
- a warpage calculation step calculating as warpage a sum of a distance from said best fit plane to a point represented by the greatest displacement value on one side with respect to said best fit plane and a distance from said best fit plane to a point represented by the greatest displacement value on the other side with respect to said best fit plane, in the plurality of points respectively represented by said plurality of displacement values.
Dependencies are inferred from the claim text.