Metrology tool recipe validator using best known methods

A method of preparing recipes for operating a metrology tool used to measure desired dimensions in microelectronic features, each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature, comprising:

• providing a database including a plurality of known instructions with best known methods for measuring different dimensions in a microelectronic feature;
• providing a desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature, the desired recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements;
• comparing the instructions in the desired recipe with the instructions in the database prior to using the recipe by the metrology tool;
• identifying differences between the instructions in the desired recipe and the instructions in the database;
• modifying the instructions in the desired recipe to conform to the instructions in the database;
• using the modified desired recipe by the metrology tool;
• and
• using the desired recipe to execute a microelectronic feature measurement on the metrology tool.

A method of preparing recipes for operating a metrology tool used to measure desired dimensions in microelectronic features, each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature, comprising:

• providing a desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature, the desired recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements;
• comparing the instructions in the desired recipe with the instructions in an existing recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements for the same technology and or process prior to using the recipe by the metrology tool;
• identifying differences between the instructions in the desired recipe and the instructions in the existing recipe for the same technology and or process;
• modifying the instructions in the desired recipe to conform to the instructions in the existing recipe for the same technology and or process;
• using the modified desired recipe by the metrology tool;
• and
• using the desired recipe to execute a microelectronic feature measurement on the metrology tool.