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US 2007/0191505 A1Published application
Radiation-curable liquid resin composition
AssigneesDsm IP Assets B.V., Jsr Corporation
InventorsAtsuya Takahashi, Takeo Shigemoto, Zen Komiya, Hiroki Ohara
Life of this patent
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Abstract
The invention relates to a radiation-curable liquid resin composition comprising: (A) 20-90 wt % of a urethane (meth)acrylate oligomer, and (B) 1-35 wt % of a monomer shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4 represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or a monomer including a hydroxyl group.
Claims16
A radiation-curable liquid resin composition comprising:
- (A) 20-90 wt % of a urethane (meth)acrylate oligomer, and
- (B) 1-35 wt % of a monomer shown by the following formula (1),
- wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4 represents a hydrogen atom or a methyl group, and n represents an integer of 1-6.
Dependencies are inferred from the claim text.