Laser irradiation method and method of manufacturing a semiconductor device

A laser irradiation method comprising:

• determining, from pattern information of a sub-island obtained by patterning a semiconductor film formed over a substrate, a specific region on the substrate that is to be irradiated with laser light, the region including the sub-island;
• using an optical system to partially overlap beam spots of plural laser lights that are outputted from plural laser oscillation apparatuses so that centers draw a straight line to form one beam spot;
• using a slit to reduce a width in a direction perpendicular to a scanning direction of the beam spot formed;
• running the beam spot with the reduced width over the specific region to enhance crystallinity of the sub-island;
• and
• patterning the sub-island with enhanced crystallinity to form an island.

A laser irradiation method comprising:

• patterning a semiconductor film formed over a substrate to form a sub-island using a mask;
• detecting pattern information of the sub-island using a CCD;
• grasping a position of the substrate by checking pattern information of the mask against the detected pattern information of the sub-island;
• determining, from the pattern information of the sub-island, a specific region on the substrate that is to be irradiated with a laser beam spot, the region including the sub-island;
• using an optical system to partially overlap beam spots of plural laser lights that are outputted from plural laser oscillation apparatuses to form one beam spot as the laser beam spot;
• using a slit to reduce a width in a direction perpendicular to a scanning direction of the beam spot formed;
• running the beam spot with the reduced width over the specific region to enhance crystallinity of the sub-island;
• and
• patterning the sub-island with enhanced crystallinity to form an island.

A laser irradiation method comprising:

• patterning a semiconductor film formed over a substrate to form a sub-island using a mask;
• detecting pattern information of the sub-island using a CCD;
• grasping a position of the substrate by checking pattern information of the mask against the detected pattern information of the sub-island;
• determining, from the pattern information of the sub-island, a specific region on the substrate that is to be irradiated with a laser beam spot, the region including the sub-island;
• using an optical system to partially overlap beam spots of plural laser lights that are outputted from plural laser oscillation apparatuses so that centers draw a straight line to form one beam spot as the laser beam spot;
• using a slit to reduce a width in a direction perpendicular to a scanning direction of the beam spot formed;
• running the beam spot with the reduced width over the specific region to enhance crystallinity of the sub-island;
• and
• patterning the sub-island with enhanced crystallinity to form an island.

A laser irradiation method comprising:

• determining, from pattern information of a sub-island obtained by patterning a semiconductor film formed over a substrate with a marker as the reference, a specific region on the substrate that is to be irradiated with laser light, the region including the sub-island;
• using an optical system to partially overlap beam spots of plural laser lights that are outputted from plural laser oscillation apparatuses to form one beam spot;
• using a slit to reduce a width in a direction perpendicular to a scanning direction of the beam spot formed;
• running the beam spot with the reduced width over the specific region to enhance crystallinity of the sub-island;
• and
• patterning the sub-island with enhanced crystallinity to form an island.

A laser irradiation method comprising:

• determining, from pattern information of the sub-island obtained by patterning a semiconductor film formed over a substrate with the marker as the reference, a specific region on the substrate that is to be irradiated with laser light, the region including the sub-island;
• using an optical system to partially overlap beam spots of plural laser lights that are outputted from plural laser oscillation apparatuses so that centers draw straight lines to form one beam spot;
• using a slit to reduce the width in the direction perpendicular to the scanning direction of the beam spot formed;
• running the beam spot with the reduced width over the specific region to enhance crystallinity of the sub-island;
• and
• patterning the sub-island with enhanced crystallinity to form an island.