Semiconductor having optimized insulation structure and process for producing the semiconductor

A process for producing an insulation structure in a semiconductor substrate, comprising:

• providing the semiconductor substrate;
• producing and patterning an implantation mask on a surface of the semiconductor substrate;
• implanting elements into at least one subregion of the semiconductor substrate, the implanted elements being selected in such a manner that on thermal activation they form an insulation region together with further elements of the semiconductor substrate;
• and
• forming the insulation structure by irradiating the semiconductor substrate with laser radiation, so that the at least one subregion is melted and then recrystallizes as insulation region.

A process for producing an insulation structure in a semiconductor substrate, comprising:

• providing the semiconductor substrate;
• means for producing and patterning an implantation mask on a surface of the semiconductor substrate;
• means for implanting elements into at least one subregion of the semiconductor substrate, the implanted elements being selected in such a manner that on thermal activation they form an insulation region together with further elements of the semiconductor substrate;
• and
• means for forming the insulation structure by irradiating the semiconductor substrate with laser radiation, so that the at least one subregion is melted and then recrystallizes as insulation region.