Calixresorcinarene compounds, photoresist base materials, and compositions thereof
AssigneeIdemitsu Kosan Co., Ltd.
InventorsHirotoshi Ishii, Takanori Owada, Yuzi Shibasaki, Mitsuru Ueda
Life of this patent
Estimating the term…
Abstract
A calixresorcinarene compound shown by the following formula (1), wherein R individually represents a hydrogen atom, a 1-tetrahydropyranyl group, a 1-tetrahydrofuranyl group, or one or more organic groups selected from the group consisting of the organic groups shown by the following formulas, wherein n individually represents an integer of 1 to 50, provided that a compound in which R is selected only from a hydrogen atom, a 1-tetrahydropyranyl group, and a 1-tetrahydrofuranyl group is excluded.
Claims18
1-17. (canceled)
A calixresorcinarene compound shown by formula (1),
- wherein R individually represents a hydrogen atom, a 1-tetrahydropyranyl group, a 1-tetrahydrofuranyl group, or one or more organic groups selected from the group consisting of the organic groups shown by the following formulas,
- wherein n individually represents an integer of 1 to 50,
- provided that a compound in which R is selected only from a hydrogen atom, a 1-tetrahydropyranyl group and a 1-tetrahydrofuranyl group is excluded.
A photoresist composition comprising a photoresist base material that is an extreme ultraviolet radiation-reactive organic compound shown by formula (2), obtained by washing with an acidic aqueous solution and processing with an ion-exchange resin, a photoacid generator or a photobase generator, and a quenching agent,
- wherein A is an organic group represented by one of the following formulas,
- B, C, and D are individually a group reactive with extreme ultraviolet radiation, a group reactive with an effect of a chromophore active to extreme ultraviolet radiation, or an organic group of any of the following formulas,
- wherein Ar is a phenyl group or a naphthyl group substituted with RO— and/or ROCO—, wherein R, RO—, and ROCO— are groups reactive with extreme ultraviolet radiation or groups reactive with an effect of a chromophore active to extreme ultraviolet radiation, and
- X, Y, and Z individually represent a single bond or an ether bond, and l+m+n=2, 3, 4, or 8.
A photoresist composition comprising a photoresist base material that is a radiation-reactive organic compound shown by formula (2), obtained by washing with an acidic aqueous solution and processing with an ion-exchange resin, a photoacid generator or a photobase generator, and a quenching agent,
- wherein A is an organic group represented by one of the following formulas,
- B, C, and D are individually a tert-butyloxycarbonylmethyl group, tert-butyloxycarbonyl group, or an organic group shown by formula,
- wherein P is an aromatic group having 6 to 20 carbon atoms with a valence of (r+1), Q represents an organic group having 4 to 30 carbon atoms, r is an integer of 1 to 10, and s is an integer of 0 to 10, and
- X, Y, and Z individually represent a single bond or an ether bond, and l+m+n=3 or 8.
Dependencies are inferred from the claim text.