US 2007/0190449 A1 · Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer

Abstract

To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K1 and K2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L1 and L2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M1, M2 and M3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y1 and Y2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, m3 and n1 each represent 0 or 1; and R1 represents H or a methyl group.

Claims16

Dependent claims

A resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by the following formula (1) or (2):

wherein n represents an integer of 2 to 24;
J represents a single bond or a divalent hydrocarbon group which may have a substituent and/or a heteroatom when n=2 or represents an n-valent hydrocarbon group which may have a substituent and/or a heteroatom when n≧3;
E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator;
K1 and K2 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring;
L1 and L2 each independently represent at least one selected from the group consisting of —C(O)O—, —C(O)— and —OC(O)—;
M1, M2 and M3 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene and arylene;
Y, Y1 and Y2 each independently represent an acid-decomposable linkage;
k1, k2, l1, l2, m1, m2, m3 and n1 each represent the number of K1, K2, L1, L2, M1, M2, M3 and Y2, respectively, and are each independently 0 or 1;
R1 represents a hydrogen atom or a methyl group;
and S represents a sulfur atom.

7 more elements

An acrylic resist polymer comprising an acid-decomposable unit having a structure represented by the following formula (3) and a unit having a hydrophilic group, as a structural unit:

wherein K1 and K2 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring;
L1 and L2 each independently represent at least one selected from the group consisting of —C(O)O—, —C(O)— and —OC(O)—;
M1, M2 and M3 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene and arylene;
Y1 and Y2 each independently represent an acid-decomposable linkage;
k1, k2, l1, l2, m1, m2, m3 and n1 each represent the number of K1, K2, L1, L2, M1, M2, M3 and Y2, respectively, and are each independently 0 or 1;
and R2 and R3 each independently represent a hydrogen atom or a methyl group.

3 more elements

A compound represented by the following formula (6):

wherein J represents a single bond or a divalent hydrocarbon group which may have a substituent and/or a heteroatom when n=2 or represents an n-valent hydrocarbon group which may have a substituent and/or a heteroatom when n≧3;
E1 represents a functional group having polymerization termination ability or chain transfer ability;
K1 and K2 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring;
L1 and L2 each independently represent at least one selected from the group consisting of —C(O)O—, —C(O)— and —OC(O)—;
M1 and M2 each independently represent at least one selected from the group consisting of alkylene, cycloalkylene, oxyalkylene and arylene;
Y represents an acid-decomposable linkage;
n represents an integer of 2 to 24;
and k1, k2, l1, l2, m1 and m2 each represent the number of K1, K2, L1, L2, M1 and M2, respectively, and are each independently 0 or 1.

5 more elements

Dependencies are inferred from the claim text.

Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer

Life of this patent

Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer

Life of this patent

Abstract

Claims16