Substrate processing apparatus

A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:

• a processing section that subjects a substrate to processing;
• and
• an interface provided adjacent to one end of said processing section for exchanging the substrate between said processing section and said exposure device,
• at least one of said processing section and said interface further comprising a first processing unit that cleans an edge of the substrate before exposure processing by the exposure device, and
• said first processing unit comprising
• a substrate holding device that holds the substrate substantially horizontally,
• a rotation driving mechanism that rotates the substrate held by said substrate holding device around an axis perpendicular to the substrate,
• a cleaning device that cleans the edge of the substrate rotated by said rotation driving mechanism, and
• a position correction device that corrects the position where the substrate is cleaned by said cleaning device.