Composite for formiing ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head
AssigneeSeiko Epson Corporation
InventorKoji Sumi
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AssigneeSeiko Epson Corporation
InventorKoji Sumi
Estimating the term…
Provided are a composite for forming a ferroelectric thin film which is a colloidal solution applicable to the MOD method and capable of maintaining excellent dispersion stability and preservation stability of an organometallic compound over a long term, a ferroelectric thin film, a method of manufacturing a ferroelectric thin film, and a liquid-jet head. A composite for forming a ferroelectric thin film, which is made of a colloidal solution applicable to the MOD method containing an organometallic compound including metal constituting a ferroelectric thin film, and contains water other than water of crystallization in the organometallic compound is used when forming a ferroelectric thin film in accordance with the MOD method.
A composite for forming a ferroelectric thin film made of a colloidal solution applicable to the metal organic deposition method containing an organometallic compound including metal constituting a ferroelectric thin film, comprising:
A method of manufacturing a ferroelectric thin film comprising:
Dependencies are inferred from the claim text.