System, method, and apparatus for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper

An imprinting system for photopolymer stamper fabrication, comprising:

• a membrane support having an opening;
• a membrane mounted to the membrane support such that the membrane extends and seals across the opening in the membrane support;
• a plate located adjacent the membrane for permitting at least some UV light to pass therethrough, the plate having an axis and extending in a radial direction;
• a gel pad mounted to the plate and comprising an inner portion that is axially aligned with the plate, and an outer portion that is radially spaced apart from the inner portion;
• a daughter stamper mounted to the gel pad;
• a master located adjacent the daughter stamper opposite the gel pad and having a contact surface with imprint features;
• and
• a layer of photopolymer resist located between the master and the daughter stamper for forming a pattern on the daughter stamper.

A method of fabricating a photopolymer stamper, comprising:

• (a) configuring a gel pad with an inner portion and an outer portion radially spaced apart from the inner portion;
• (b) mounting a daughter stamper to the gel pad;
• (c) placing photopolymer resist on a master having a patterned zone;
• (d) making contact between the daughter stamper and the master such that the gel pad avoids pressure on the patterned zone of the master;
• (e) diffusing a collimated UV beam emitted toward the photopolymer resist into a randomized UV incident beam to cure the photopolymer resist;
• and
• (f) releasing the daughter stamper and master such that a pattern is formed on the daughter stamper by the cured photopolymer resist.