Transforming metrology data from a semiconductor treatment system using multivariate analysis

A computer-readable medium containing computer executable instructions for causing a computer to transform metrology data from a semiconductor treatment system using multivariate analysis, comprising instructions for:

• a) obtaining a set of metrology data measured or simulated for one or more substrates treated using the treatment system;
• b) determining one or more essential variables for the obtained set of metrology data using multivariate analysis;
• c) obtaining a first metrology data measured or simulated for one or more substrates treated using the treatment system, wherein the first metrology data is not one of the metrology data in the set of metrology data obtained in a);
• and
• d) transforming the first metrology data obtained in c) into a second metrology data using the one or more essential variables determined in b).

A system to transform metrology data from a semiconductor treatment system using multivariate analysis, the system comprising:

• a metrology system to measure a set of metrology data for one or more substrates treated using the treatment system;
• and
• a data processing system configured to:
• a) obtain the set of metrology data;
• b) determine one or more essential variables for the obtained set of metrology data using multivariate analysis;
• c) obtain a first metrology data measured using the metrology system for one or more substrates treated using the treatment system, wherein the first metrology data is not one of the metrology data in the set of metrology data obtained in a);
• and
• d) transform the first metrology data obtained in c) into a second metrology data using the one or more essential variables determined in b).