Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorHiromi Kemmoku
Life of this patent
Estimating the term…
Abstract
An exposure apparatus for exposing a substrate to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to update the parameter. Prior to execution of a unit of the processing, the control system determines that the update system is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.
Claims18
1-15. (canceled)
An exposure apparatus for exposing a substrate to a pattern, said apparatus comprising:
- an update system to update a parameter necessary for processing in said exposure apparatus through measurement;
- a setting system to set a validity period of the parameter updated by said update system;
- and
- a control system to cause said update system to update the parameter,
- wherein, prior to execution of a unit of the processing, said control system determines that said update system is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.
A control method for an exposure apparatus for exposing a substrate to a pattern, said method comprising steps of:
- updating a parameter necessary for processing in the exposure apparatus through measurement;
- setting a validity period of the parameter updated in said updating step;
- and
- causing said updating step to update the parameter,
- wherein, prior to execution of a unit of the processing, said causing step determines that said updating step is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.
An exposure apparatus for exposing a substrate to a pattern, said apparatus comprising:
- update means for updating a parameter necessary for processing in said exposure apparatus through measurement;
- setting means for setting a validity period of the parameter updated by said update means;
- and
- control means for causing said update means to update the parameter,
- wherein, prior to execution of a unit of the processing, said control means determines that said update means is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.
An exposure apparatus for exposing a substrate to a pattern, said apparatus being configured to:
- update a parameter necessary for processing in said exposure apparatus through measurement;
- set a validity period of the updated parameter;
- and
- cause the updating to be performed based on the validity period,
- wherein, prior to execution of a unit of the processing, it is determined that the updating is to be caused to be performed if a predicted completion time of the unit is after expiration of the validity period.
Dependencies are inferred from the claim text.