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AssigneeDow Global Technologies LLC
InventorsKiran Baikerikar, Shaoguang Feng, Jack Hetzner, John Maher, Michael Mills, Paul Popa, Richard Strittmatter, Larry Wilson
Estimating the term…
A curable organosilicate composition that is employed to form one or more layers in the fabrication of electronic devices comprising: (a) an alkoxy or acyloxy silane having at least one group containing ethylenic unsaturation which group is bonded to the silicon atom (b) an alkoxy oracyloxy silane having at least one group containing an aromatic ring which group is bonded to the silicon atom, (c) a latent acid catalyst, and (d) optionally an alkoxy or acyloxy silane having at least one C1-C6 alkyl group bonded to the silicon atom.
A curable organosilicate composition that is usefully employed in the formation of a hardmask, etchstop, antireflective, adhesion promoting, or other layer in the fabrication of electronic devices comprising:
Dependencies are inferred from the claim text.