US 2007/0184757 A1 · POLISHING SHEET AND POLISHING WORK METHOD

Abstract

The present invention provides a polishing sheet that can secure a flatness of a material to be polished and can improve a polishing efficiency. A polishing pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 has large cells 3 with a generally triangular sectional configuration rounded along a thickness direction thereof. Polyurethane resin exists in the polyurethane sheet 2 in a partition wall manner and fine foams 4 are formed in the polyurethane resin. Fine particles 5 added during manufacture of the polyurethane sheet 2 exist inside some of the fine foams 4 and the fine particles 5 are separable from the fine foams. By separating off fine particles positioned at a polishing face P by dummy polishing or the like, fine foams which evenly reserve a polishing liquid containing abrasive particles are formed at the polishing face P.

Claims2

Dependent claims

A polishing work method for a material to be polished, which uses a polishing sheet which has an elastic plastic foam sheet in which fine particles are contained and has a fine foam structure to be formed at a polishing face thereof by separating off the fine particles, comprising the steps of;

attaching the polishing sheet to a surface plate of a polishing machine;
and
after all the fine particles are substantially separated off from the polishing face, performing polishing work with the polishing sheet to the material to be polished by using a polishing liquid containing abrasive particles.

Dependencies are inferred from the claim text.

Facts

Application

11/733,137Filed 9 Apr 2007

Priority

JP 2003-1575263 Jun 2003

Published

9 Aug 2007

Term ends

Not estimatedThe source records don’t support an estimate.

Classification18 codes

B32B 5/18
Layered products characterised by the non- homogeneity or physical structure , i.e. comprising a fibrous, filamentary, particulate or foam…
B24B 37/24
Lapping pads for working plane surfaces: characterised by the composition or properties of the pad materials
B24D 3/32
Resins or natural or synthetic macromolecular compounds: for porous or cellular structure
B32B 27/40
Layered products comprising a layer of synthetic resin: comprising polyurethanes

Polishing sheet and polishing work method

Life of this patent

Polishing sheet and polishing work method

Life of this patent

Abstract

Claims2