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US 2007/0184667 A1Published application
Insulating layer patterning method, insulating layer formed by the insulating layer patterning method, display device having the insulating layer
AssigneeSamsung Electronics Co., Ltd.
InventorsSang-jun Choi, Jung-hyun Lee, Sang-bong Bang
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Abstract
Provided is an insulation layer patterning method employing a flowable oxide, which does not use a photo-resist. Also, an insulation layer pattern and display devices including the insulation layer are disclosed.
Claims21
A method for producing an insulation layer pattern which/comprises:
- (a) forming a flowable oxide insulation layer on a surface of a substrate, said flowable oxide insulation layer being formed of a flowable oxide and a carrier solvent;
- (b) exposing a region of the flowable oxide insulation layer to an energy source thereby removing the carrier solvent from the exposed region of the flowable oxide insulation layer while an unexposed region of the flowable oxide insulation layer retains the carrier solvent;
- and
- (c) contacting the unexposed region of the flowable oxide insulation layer with a developer which is capable of dissolving the carrier solvent and the flowable oxide, thereby removing the carrier solvent and the flowable oxide from the exposed region to form an insulation layer pattern on the substrate.
1 more element
Dependencies are inferred from the claim text.