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US 2007/0184639 A1Published application
Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsKoichiro Tanaka, Hirotada Oishi
Life of this patent
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Abstract
A method for rapidly performing laser irradiation in a desired position as laser irradiation patterns are switched is proposed. A laser beam emitted from a laser oscillator is entered into a deflector, and a laser beam which has passed through the deflector is entered into a diffractive optical element to be diverged into a plurality of laser beams. Then, a photoresist formed over an insulating film is irradiated with the laser beam which is made to diverge into the plurality of laser beams, and the photoresist irradiated with the laser beam is developed so as to selectively etch the insulating film.
Claims35
A method for manufacturing a memory element comprising:
- forming a plurality of regions to be a memory cell including an insulating film over a substrate;
- performing a deflection of a laser beam by a deflector so that the laser beam passes through one of diffractive optical elements to form a plurality of laser beams;
- and
- irradiating the plurality of regions with the plurality of laser beams to selectively form contact holes in the insulating film.
1 more element
A method for manufacturing a memory element comprising:
- forming a plurality of island-shaped semiconductor layers over a substrate;
- forming a first insulating film over the plurality of island-shaped semiconductor layers;
- forming a gate electrode over each of the plurality of island-shaped semiconductor layers with the first insulating film interposed therebetween;
- forming a second insulating film over the gate electrodes;
- providing a resist over the second insulating film;
- performing a deflection of a laser beam by a deflector so that the laser beam passes through one of diffractive optical elements to form a plurality of laser beams;
- irradiating the resist with the plurality of laser beams;
- and
- etching the first insulating film and the second insulating film by development of the resist irradiated with the laser beams to selectively form contact holes.
6 more elements
A method for manufacturing a memory element comprising the steps of:
- forming a plurality of island-shaped semiconductor layers over a substrate;
- forming a first insulating film over the plurality of island-shaped semiconductor layers;
- forming a gate electrode over each of the plurality of island-shaped semiconductor layers with the first insulating film interposed therebetween;
- forming a second insulating film over the gate electrodes;
- providing a resist over the second insulating film;
- performing a deflection of a first laser beam by a first deflector so that the first laser beam passes through one of first diffractive optical elements to form a first plurality of laser beams;
- performing a deflection of a second laser beam by a second deflector so that the second laser beam passes through one of second diffractive optical elements to form a second plurality of laser beams;
- irradiating the resist with the first and the second plurality of laser beams;
- and
- etching the first insulating film and the second insulating film by development of the resist irradiated with the first and the second plurality of laser beams to selectively form contact holes.
7 more elements
A laser irradiation apparatus comprising:
- a laser oscillator for emitting a laser beam;
- a deflector for performing deflection of the laser beam emitted from the laser oscillator;
- diffractive optical elements for diverging a laser beam passed through the deflector into a plurality of laser beams;
- and
- a transport stage for mounting an object which is irradiated with the plurality of laser beams.
2 more elements
A laser irradiation apparatus comprising:
- a plurality of laser oscillators for emitting laser beams;
- a plurality of deflectors for performing deflection of the laser beams each emitted from the plurality of laser oscillators;
- a plurality of diffractive optical elements for diverging each of laser beams passed through the plurality of deflectors into a plurality of laser beams;
- and
- a transport stage for mounting an object which is irradiated with the plurality of laser beams.
2 more elements
A laser irradiation method comprising:
- entering a laser beam emitted from a laser oscillator into a deflector;
- entering a laser beam passed through the deflector into a first diffractive optical element or a second diffractive optical element, wherein the first diffractive optical element and the second diffractive optical element have a different pattern each other;
- and
- irradiating an object mounted on a transport stage with a laser beam passed through the first diffractive optical element or the second diffractive optical element.
1 more element
A laser irradiation method comprising:
- entering a laser beam emitted from a laser oscillator into a deflector;
- entering a laser beam passed through the deflector into one of diffractive optical elements to diverge into a plurality of laser beams;
- and
- irradiating an object mounted on a transport stage with the plurality of laser beams.
1 more element
A laser irradiation method comprising:
- entering each of laser beams emitted from a plurality of laser oscillators into a plurality of different deflectors;
- entering each of laser beams passed through the plurality of deflectors into a plurality of different diffractive optical elements to diverge one of the laser beams into a plurality of laser beams;
- and
- irradiating an object mounted on a transport stage with the plurality of laser beams.
1 more element
Dependencies are inferred from the claim text.