Micromechanical Device And Method For Manufacturing A Micromechanical Device
AssigneeInfineon Technologies AG
InventorsKarlheinz Mueller, Bernhard Winkler
Life of this patent
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Abstract
In a method for manufacturing a micromechanical device having a region for forming an integrated circuit, at first a first layer is produced on a deeper-lying part in the substrate. Subsequently, a membrane layer is produced on the first layer and at least one channel completely penetrating the membrane layer is introduced in the membrane layer. After that, a region of the first layer below the membrane layer is removed to form a cavity. Finally, the channel is sealed and a planar surface is formed.
Claims20
A method for manufacturing a micromechanical device comprising a region for forming an integrated circuit, comprising:
- producing a recess in a substrate;
- producing a first layer in the recess;
- producing a membrane layer on the first layer;
- introducing at least one channel into the membrane layer, the channel completely penetrating the membrane layer;
- removing a region of the first layer below the membrane layer to form a cavity;
- sealing the at least one channel;
- and
- forming a planar surface,
- wherein the first layer and the membrane layer are produced in the recess such that the cavity is located in the recess.
A micromechanical device comprising a region for forming an integrated circuit, comprising:
- a recess in the substrate;
- a first layer in the recess;
- a membrane layer on the first layer, the membrane layer covering a cavity in the first layer;
- and
- a planar surface,
- wherein the region for forming the integrated circuit is outside a region in which the membrane layer is formed;
- and
- wherein the first layer and the cavity are located in the recess.
A method for manufacturing a micromechanical device comprising a region for forming an integrated circuit, comprising:
- producing a first layer on a substrate;
- producing a membrane layer on the first layer;
- introducing at least one channel into the membrane layer, the channel completely penetrating the membrane layer;
- removing a region of the first layer below the membrane layer to form a cavity;
- sealing the at least one channel;
- and
- forming a planar surface.
A micromechanical device comprising a region for forming an integrated circuit, comprising:
- a first layer on a substrate;
- a membrane layer on the first layer, the membrane layer covering a cavity in the first layer;
- and
- a planar surface,
- wherein the region for forming the integrated circuit is outside a region in which the membrane layer is formed.
Dependencies are inferred from the claim text.