Method of applying patterned metallization to block filter resonators
AssigneeResearch In Motion RF, Inc.
InventorsLuna Chiu, Chen Zhang, John King, Barry Treadway, George Kang
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Abstract
An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
Claims11
A method of applying patterned metallization to a ceramic block comprising:
- applying a photodefinable ink to said ceramic block;
- drying said ink;
- exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern;
- developing said pattern in a developer solution thereby forming a patterned ceramic block;
- and
- rinsing, drying and firing said patterned ceramic block.
A method for production of photodefinable metallization on electric communication signal block resonators with rounded edges and square edges, comprising:
- applying a photodefinable ink to said block;
- drying said ink;
- exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern;
- developing said pattern in a developer solution thereby forming a patterned block;
- and
- rinsing, drying and firing said patterned block.
Dependencies are inferred from the claim text.