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US 2007/0184384 A1Published application
Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition
AssigneeFUJIFILM Corporation
InventorYasutomo Kawanishi
Life of this patent
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Abstract
A photosensitive composition, which comprises a compound represented by formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents a counter anion; and a pattern-forming method using the photosensitive composition.
Claims6
A photosensitive composition, which comprises a compound represented by formula (I):
- wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group;
- Z represents a single bond or a divalent linking group;
- and
- X− represents a counter anion.
1 more element
A compound represented by formula (I):
- wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group;
- Z represents a single bond or a divalent linking group;
- and
- X− represents a counter anion.
1 more element
Dependencies are inferred from the claim text.