Patterning method and manufacturing method for a display device
AssigneeSamsung Electronics Co., Ltd.
InventorBo-sung Kim
Life of this patent
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Abstract
A patterning method includes coating a photosensitive surface active agent on a base film, forming an organic layer on the surface active agent, decreasing adhesion between the surface active agent and the organic layer by exposing light through a mask having a predetermined opening on the organic layer, adhering the base film to an insulating substrate with the organic layer facing the insulating substrate, and transferring the organic layer which is corresponded to the exposed surface active agent to the insulating substrate by separating the base film from the insulating substrate. The method provides a simplified patterning process, and a manufacturing method of a display device using the same.
Claims16
A patterning method, comprising:
- coating a photosensitive surface active agent on a base film;
- forming an organic layer on the surface active agent;
- decreasing adhesiveness between the surface active agent and the organic layer by exposing the surface active agent to light through a mask having a predetermined opening on the organic layer;
- adhering the base film to an insulating substrate, with the organic layer facing the insulating substrate;
- and
- transferring the organic layer which corresponds to the exposed surface active agent to the insulating substrate by separating the base film from the insulating substrate.
Dependencies are inferred from the claim text.