Technique for depositing metallic films using ion implantation surface modification for catalysis of electroless deposition

Abstract

Techniques for depositing metallic films using ion implantation surface modification for catalysis of electroless deposition are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for depositing a metallic film. The method may comprise depositing a catalyzing material on a structure, wherein the structure comprises a substrate, a dielectric layer on the substrate, and a resist layer on the dielectric layer, wherein the dielectric layer and the resist layer have one or more openings. The method may also comprise stripping the resist layer. The method may further comprise depositing a metallic film on the catalyzing material in the one or more openings of the structure to fill the one or more openings.

Dependencies are inferred from the claim text.