Back to results
US 2007/0183046 A1Published application
Method of Forming a Diffractive Optical Element
AssigneeASML Holding N.V.
InventorRonald Wilklow
Life of this patent
Estimating the term…
Abstract
A diffraction element can be used in a system employing very short wavelengths of light, for example light in the nanometer range (e.g., about 100 nm to about 300 nm). The diffraction element is formed using a substrate (or any optical element) having high transmission characteristics in this wavelength range. For example, calcium fluoride or barium fluoride can be used. A layer of amorphous isotropic material, such as silicon dioxide or silica, is deposited on the substrate and patterned to allow for diffraction.
Claims11
A method of making a diffractive optical element, comprising:
- forming an amorphous isotropic layer having a thickness of about 157 nm to about 193 nm on an anisotropic substrate that transmits light having wavelengths of about 157 nm to about 193 nm without substantial attenuation of the light;
- patterning the amorphous isotropic layer;
- and
- performing an non-anisotropic etch to remove a portion of the amorphous isotropic layer from regions of the anisotropic substrate.
1 more element
Dependencies are inferred from the claim text.