Diffractive Optical Element, Illumination System Comprising the Same, and Method of Manufacturing Semiconductor Device Using Illumination System

A method of manufacturing a semiconductor device, the method comprising:

• providing a substrate coated with a photosensitive film;
• and
• using a laser light source to project a mask pattern of a reticle above the substrate onto the photosensitive film, wherein a diffractive optical element (DOE) has an uneven surface that produces a multipole illumination shape I(r,θ) expressed by multiplying a radial scope element A(r) and an angular scope element C(r,θ), wherein r and θ are a radius and an angle of polar coordinates, respectively, and θ is dependent on r, and wherein a position of the poles and sizes of the poles in an angular scope vary with a radial scope used in producing the multipole illumination shape.

An illumination system for manufacturing a semiconductor device, the system comprising:

• a laser light source projecting a mask pattern of a reticle above a substrate onto a photosensitive film;
• a diffractive optical element (DOE) having an uneven surface that produces differently shaped multipole illuminations depending on a radial scope used, wherein a multipole illumination shape is used to project the mask pattern onto the substrate, and wherein the multipole illumination shape has an angular scope that depends on a radius and an angle of the produced multipole illumination shape.